Riopel Yan
2Patents
2h-index
2Co-inventors
24Inventor score
Filing activity: Mar 7, 2001 → Mar 7, 2001
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US6686214B2 | Method of aligning a photolithographic mask to a crystal plane | Electricity | 10 | Expired |
| US6770213B2 | Method of inspecting an anisotropic etch in a microstructure | Electricity | 4 | Expired |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.