Robbert W. E. Van De Kruijs
3Patents
2h-index
11Co-inventors
41Inventor score
Filing activity: Nov 12, 2003 → Dec 20, 2013
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US7261957B2 | Multilayer system with protecting layer system and production method | Emerging Cross-Sectional Technologies | 8 | Expired |
| US8144830B2 | Reflective optical element for EUV lithography device | Performing Operations; Transporting | 7 | Active |
| US9733580B2 | Method for producing a reflective optical element for EUV-lithography | Physics | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.