Robert Hendry
14Patents
8h-index
16Co-inventors
65Inventor score
Filing activity: Sep 24, 1987 → Jun 19, 2006
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US5180435A | Remote plasma enhanced CVD method and apparatus for growing an epitaxial semiconductor layer | Chemistry; Metallurgy | 563 | Expired |
| US4870030A | Remote plasma enhanced CVD method for growing an epitaxial semiconductor layer | Emerging Cross-Sectional Technologies | 63 | Expired |
| US5018479A | Remote plasma enhanced CVD method and apparatus for growing an epitaxial semconductor layer | Chemistry; Metallurgy | 56 | Expired |
| US6552295B2 | Plasma furnace disposal of hazardous wastes | Emerging Cross-Sectional Technologies | 35 | Expired |
| US5418018A | Chemical vapor deposition of diamond films using water-based plasma discharges | Chemistry; Metallurgy | 17 | Expired |
| US5874014A | Durable plasma treatment apparatus and method | Electricity | 11 | Expired |
| US6558504B1 | Plasma processing system and method | Electricity | 10 | Expired |
| US5908565A | Line plasma vapor phase deposition apparatus and method | Electricity | 8 | Expired |
| US6105518A | Durable plasma treatment apparatus and method | Electricity | 8 | Expired |
| US5643639A | Plasma treatment method for treatment of a large-area work surface apparatus and methods | Electricity | 7 | Expired |
| US5800620A | Plasma treatment apparatus | Electricity | 6 | Expired |
| US5480686A | Process and apparatus for chemical vapor deposition of diamond films using water-based plasma discharges | Chemistry; Metallurgy | 6 | Expired |
| US7706152B2 | DC-DC converter for low voltage power source | Electricity | 5 | Active |
| US7112536B2 | Plasma processing system and method | Electricity | 3 | Expired |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.