Roland Loercher
2Patents
1h-index
11Co-inventors
31Inventor score
Filing activity: Jan 13, 2012 → Jun 15, 2012
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US8928980B2 | Micromirror arrangement having a coating and method for the production thereof | Physics | 2 | Active |
| US9494718B2 | Mirror for the EUV wavelength range, substrate for such a mirror, projection objective for microlithography comprising such a mirror or such a substrate, and projection exposure apparatus for microlithography comprising such a projection objective | Physics | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.