Patent · US Active

Micromirror arrangement having a coating and method for the production thereof

US8928980B2 · kind B2 · utility

2Cited by

5References

12Claims

0Family size

Assignee

Carl Zeiss SMT GmbH · DE

Inventors

Karl-Stefan Weissenrieder · Langenau, DE
Roland Loercher · Aalen, DE
Alexandra Pazidis · Aalen, DE

Key dates

Filing date	Jan 13, 2012
Grant date	Jan 6, 2015
Priority date	—
Expiry date	Jan 22, 2032

Classification

Technology area (CPC G)Physics
CPC primaryG03F7/70291
WIPO fieldOptics
WIPO sectorInstruments

Abstract

A micromirror arrangement (1) having: at least one micromirror (3) having a reflective surface (11) formed at a mirror substrate (2), and an antireflective coating (7) formed at the mirror substrate (2) outside the reflective surface (11). A reflective coating (8) is formed within the reflective surface (11) and has at least two layer subsystems, wherein the first layer subsystem has layers (8e, 8f) composed of a periodic sequence of alternate high and low refractive index layers composed of a nonmetallic material and is optimized with regard to the reflectivity in respect of a used wavelength of the micromirror arrangement, and wherein the second layer subsystem is optimized with regard to the reflectivity in respect of a measurement wavelength of the micromirror arrangement, said measurement wavelength deviating from the used wavelength.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.