Ryosuke Yoda
2Patents
1h-index
7Co-inventors
27Inventor score
Filing activity: Sep 25, 2015 → Jul 1, 2016
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US10286521B2 | Dressing apparatus and dressing method of polishing pad of double-side polishing apparatus | Performing Operations; Transporting | 2 | Active |
| US10532442B2 | Polishing apparatus and wafer polishing method | Electricity | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.