Seongha JEONG
2Patents
1h-index
12Co-inventors
34Inventor score
Filing activity: Jan 29, 2019 → May 11, 2020
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US10818503B2 | Method of etching at low temperature and plasma etching apparatus | Electricity | 2 | Active |
| US11251022B2 | Gas supply assembly and substrate processing apparatus including the same | Electricity | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.