Shaista Babar
2Patents
2h-index
4Co-inventors
33Inventor score
Filing activity: Oct 31, 2011 → Nov 10, 2015
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US10103057B2 | Use of an inhibitor molecule in chemical vapor deposition to afford deposition of copper on a metal substrate with no deposition on adjacent SIO2 substrate | Electricity | 4 | Active |
| US8846146B2 | Smoothing agents to enhance nucleation density in thin film chemical vapor deposition | Chemistry; Metallurgy | 2 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.