Stuart E. Brown
7Patents
4h-index
6Co-inventors
39Inventor score
Filing activity: Dec 1, 1998 → Apr 30, 2002
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US6405144B1 | Method and apparatus for programmed latency for improving wafer-to-wafer uniformity | Electricity | 44 | Expired |
| US6271602A | Method for reducing the susceptibility to chemical-mechanical polishing damage of an alignment mark formed in a semiconductor substrate | Electricity | 21 | Expired |
| US6410191B1 | Phase-shift photomask for patterning high density features | Physics | 12 | Expired |
| US6207966A | Mark protection with transparent film | Electricity | 9 | Expired |
| US6780568B1 | Phase-shift photomask for patterning high density features | Physics | 4 | Expired |
| US6178256A | Removal of reticle effect on critical dimension by reticle rotation | Physics | 3 | Expired |
| US6562521B1 | Semiconductor feature having support islands | Physics | 1 | Expired |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.