TAEIL CHO
1Patents
0h-index
8Co-inventors
19Inventor score
Filing activity: Jun 29, 2020 → Jun 29, 2020
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US11348760B2 | Plasma processing apparatus and method of manufacturing semiconductor device using the same | Electricity | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.