Therese McDonough
1Patents
1h-index
4Co-inventors
25Inventor score
Filing activity: Mar 14, 1983 → Mar 14, 1983
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US4479455A | Process gas introduction and channeling system to produce a profiled semiconductor layer | Chemistry; Metallurgy | 11 | Expired |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.