Tobias Hackl
2Patents
1h-index
11Co-inventors
34Inventor score
Filing activity: Dec 13, 2012 → Dec 28, 2015
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US8546776B2 | Optical system for EUV lithography with a charged-particle source | Physics | 1 | Active |
| US9921483B2 | Surface correction of mirrors with decoupling coating | Physics | 1 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.