Tz-Wei Lin
2Patents
0h-index
5Co-inventors
24Inventor score
Filing activity: Nov 15, 2013 → Oct 5, 2015
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US9177875B2 | Advanced process control method for controlling width of spacer and dummy sidewall in semiconductor device | Electricity | 0 | Active |
| US9613816B2 | Advanced process control method for controlling width of spacer and dummy sidewall in semiconductor device | Electricity | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.