Walter Hubbard
4Patents
3h-index
7Co-inventors
47Inventor score
Filing activity: Jul 10, 1997 → Sep 25, 2018
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US5898479A | System for monitoring optical properties of photolithography equipment | Physics | 30 | Expired |
| US6412326B1 | SEMICONDUCTOR CALIBRATION STRUCTURES, SEMICONDUCTOR CALIBRATION WAFERS, CALIBRATION METHODS OF CALIBRATING SEMICONDUCTOR WAFER COATING SYSTEMS, SEMICONDUCTOR PROCESSING METHODS OF ASCERTAINING LAYER ALIGNMENT DURING PROCESSING AND CALIBRATION METHODS OF | Physics | 15 | Expired |
| US6094965A | Semiconductor calibration structures and calibration wafers for ascertaining layer alignment during processing and calibrating multiple semiconductor wafer coating systems | Physics | 6 | Expired |
| US10571212B1 | Lodged projectile removal charge | Mechanical Engineering; Lighting; Heating | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.