Wei Wang
3Patents
1h-index
7Co-inventors
33Inventor score
Filing activity: Jun 19, 2018 → Nov 6, 2023
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US10497566B1 | Layout design for fanout patterns in self-aligned double patterning process | Physics | 1 | Active |
| US11043417B2 | Line structure for fan-out circuit and manufacturing method thereof, and photomask pattern for fan-out circuit | Electricity | 0 | Active |
| US11965920B1 | Method for achieving terminal-pair definition of four-terminal-pair impedance and application thereof | Physics | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.