William C. Replogle
6Patents
4h-index
9Co-inventors
50Inventor score
Filing activity: Jan 13, 1999 → Sep 17, 2018
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US6333775A | Extreme-UV lithography vacuum chamber zone seal | Physics | 59 | Expired |
| US6225027A | Extreme-UV lithography system | Emerging Cross-Sectional Technologies | 20 | Expired |
| US6744493B1 | In-vacuum exposure shutter | Physics | 4 | Expired |
| US6545745B2 | Extreme-UV lithography vacuum chamber zone seal | Physics | 4 | Expired |
| US6549264B2 | Extreme-UV lithography vacuum chamber zone seal | Physics | 2 | Expired |
| US11119384B2 | Hermetic sealing of a nonlinear crystal for use in a laser system | Physics | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.