Extreme-UV lithography vacuum chamber zone seal
US6333775A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Jan 13, 1999 |
| Grant date | Dec 25, 2001 |
| Priority date | — |
| Expiry date | Jan 13, 2019 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70841
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
Control of particle contamination on the reticle and carbon contamination of optical surfaces in photolithography systems can be achieved by the establishment of multiple pressure zones in the photolithography systems. The different zones will enclose the reticle, projection optics, wafer, and other components of system. The system includes a vacuum apparatus that includes: a housing defining a vacuum chamber; one or more metrology trays situated within the vacuum chamber each of which is supported by at least one support member, wherein the tray separates the vacuum chamber into a various compartments that are maintained at different pressures; and conductance seal devices for adjoining the perimeter of each tray to an inner surface of the housing wherein the tray is decoupled from vibrations emanating from the inner surface of the housing.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.