Nano-electromechanical system (NEMS) device structure and method for forming the same
US10000373B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Jan 27, 2016 |
| Grant date | Jun 19, 2018 |
| Priority date | — |
| Expiry date | Feb 17, 2036 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB81C2203/0771
- WIPO fieldMicro-structural and nano-technology
- WIPO sectorChemistry
Abstract
A NEMS device structure and a method for forming the same are provided. The NEMS device structure includes a substrate and an interconnect structure formed over the substrate. The NEMS device structure includes a dielectric layer formed over the interconnect structure and a beam structure formed in and over the dielectric layer. The beam structure includes a fixed portion and a moveable portion, the fixed portion is extended vertically, and the movable portion is extended horizontally. The NEMS device structure includes a cap structure formed over the dielectric layer and the beam structure and a cavity formed between the beam structure and the cap structure.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.