Metrology targets with filling elements that reduce inaccuracies and maintain contrast
US10002806B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Jan 26, 2015 |
| Grant date | Jun 19, 2018 |
| Priority date | — |
| Expiry date | Jan 30, 2035 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01N21/4785
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
The subject application relates to metrology targets with filling elements that reduce inaccuracies and maintain contrast. The present invention provides a metrology target and a method to design the metrology target. The metrology target comprises specified filling elements introduced into identified continuous regions in a given target design, wherein parameters of the introduced filling elements are determined by a trade-off between a contrast requirement and an inaccuracy requirement which is associated via production with the identified continuous regions. The method includes the steps of identifying continuous regions in a target design, and introducing specified filling elements into the identified continuous regions, wherein parameters of the introduced filling elements are determined by a trade-off between a contrast requirement and an inaccuracy requirement which is associated via production with the identifying continuous regions. At least one of the identifying and the introducing can be carried out by at least one computer processor.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.