Raviv Yohanan
14Patents
3h-index
29Co-inventors
52Inventor score
Filing activity: Jan 26, 2015 → Jun 1, 2023
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US10527951B2 | Compound imaging metrology targets | Physics | 13 | Active |
| US10274837B2 | Metrology target for combined imaging and scatterometry metrology | Physics | 5 | Active |
| US10002806B2 | Metrology targets with filling elements that reduce inaccuracies and maintain contrast | Physics | 5 | Active |
| US11355375B2 | Device-like overlay metrology targets displaying Moiré effects | Physics | 2 | Active |
| US11532566B2 | Misregistration target having device-scaled features useful in measuring misregistration of semiconductor devices | Electricity | 1 | Active |
| US11862524B2 | Overlay mark design for electron beam overlay | Electricity | 1 | Active |
| US10303835B2 | Method and apparatus for direct self assembly in target design and production | Emerging Cross-Sectional Technologies | 1 | Active |
| US12111580B2 | Optical metrology utilizing short-wave infrared wavelengths | Physics | 0 | Active |
| US11353493B2 | Data-driven misregistration parameter configuration and measurement system and method | Electricity | 0 | Active |
| US11067904B2 | System for combined imaging and scatterometry metrology | Physics | 0 | Active |
| US10401841B2 | Identifying registration errors of DSA lines | Physics | 0 | Active |
| US12055859B2 | Overlay mark design for electron beam overlay | Physics | 0 | Active |
| US11720031B2 | Overlay design for electron beam and scatterometry overlay measurements | Physics | 0 | Active |
| US11703767B2 | Overlay mark design for electron beam overlay | Physics | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.