Liquid doping systems and methods for controlled doping of single crystal semiconductor material
US10006145B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Dec 31, 2013 |
| Grant date | Jun 26, 2018 |
| Priority date | — |
| Expiry date | Apr 15, 2034 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T117/1056
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A doping system for introducing liquid dopant into a melt of semiconductor or solar-grade material includes a dopant reservoir for holding dopant and a feeding tube. The dopant reservoir includes a body and a tapered end defining an opening having a smaller cross-sectional area than a cross-sectional area of the body. The feeding tube includes a first end extending from the opening of the reservoir, a second end distal from the first end, an angled tip disposed at the second end of the feeding tube, a first restriction for inhibiting the passage of solid dopant through the feeding tube, and a second restriction for controlling the flow of liquid dopant, the second restriction disposed near the second end of the feeding tube.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.