3D localization microscopy and 4D localization microscopy and tracking methods and systems
US10007103B2 · kind B2 · utility
0Cited by
3References
11Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Nov 3, 2016 |
| Grant date | Jun 26, 2018 |
| Priority date | — |
| Expiry date | Nov 3, 2036 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG06T2207/10056
- WIPO fieldAudio-visual technology
- WIPO sectorElectrical engineering
Abstract
A 3D localization microscopy system, 4D localization microscopy system, or an emitter tracking system arranged to cause a phase difference between light passing to or from one part of the objective relative to light passing to or from another part of the objective, to produce a point emitter image which comprises two lobes, a separation between which is related to the position of the emitter relative to the objective of the imaging system, and in the 4D system a further property of the image or of the light to or from the objective is related to another location independent property of the emitter.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.