Graphene pellicle for extreme ultraviolet lithography
US10007176B2 · kind B2 · utility
1Cited by
1References
20Claims
0Family size
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Key dates
| Filing date | Nov 18, 2016 |
| Grant date | Jun 26, 2018 |
| Priority date | — |
| Expiry date | Dec 29, 2036 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC23C28/32
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A method includes depositing a first material layer over a substrate; and depositing a graphene layer over the first material layer, thereby forming a first assembly. The method further includes attaching a carrier to the graphene layer; removing the substrate from the first assembly; and removing the first material layer from the first assembly.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.