Patent · US Active

Optical arrangement of a microlithographic projection exposure apparatus

US10007186B2 · kind B2 · utility

2Cited by

1References

20Claims

0Family size

Assignee

Carl Zeiss SMT GmbH · DE

Inventors

Jens Prochnau · Oberkochen, DE
Dirk Schaffer · Jena, DE

Key dates

Filing date	Mar 17, 2017
Grant date	Jun 26, 2018
Priority date	—
Expiry date	Mar 17, 2037

Classification

Technology area (CPC G)Physics
CPC primaryG03F7/70825
WIPO fieldOptics
WIPO sectorInstruments

Abstract

An optical arrangement of a microlithographic projection exposure apparatus includes a mirror element having a mirror substrate, and a reflection region formed on a surface of the mirror substrate. The arrangement also includes at least one actuator configured to move the mirror element in at least one degree of freedom, and a mounting element, which acts on the mirror substrate. The mounting element alone holds the mirror element at least approximately in an equilibrium position, such that the at least one actuator is at least approximately free of forces in the equilibrium position.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.