Dirk Schaffer
19Patents
3h-index
26Co-inventors
56Inventor score
Filing activity: Dec 3, 2004 → Mar 14, 2023
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US9134501B2 | Optical element unit and method of supporting an optical element | Physics | 5 | Active |
| US7471469B2 | Device for the low-deformation replaceable mounting of an optical element | Physics | 4 | Expired |
| US8848167B2 | Optical element for UV or EUV lithography with coatings having optimized stress and thickness | Physics | 3 | Active |
| US7085080B2 | Low-deformation support device of an optical element | Physics | 2 | Expired |
| US10095126B2 | Moveably mounted component of projection exposure system, as well as device and method for movement limitation for same | Mechanical Engineering; Lighting; Heating | 2 | Active |
| US10007186B2 | Optical arrangement of a microlithographic projection exposure apparatus | Physics | 2 | Active |
| US9250417B2 | Optical arrangement in a microlithographic projection exposure apparatus | Physics | 2 | Active |
| US9046795B2 | Optical element unit for exposure processes having sealing element | Emerging Cross-Sectional Technologies | 1 | Active |
| US10215948B2 | Optical element module with minimized parasitic loads | Physics | 1 | Active |
| US8582081B2 | Device for the low-deformation replaceable mounting of an optical element | Physics | 1 | Active |
| US8351139B2 | Optical element module with minimized parasitic loads | Physics | 1 | Active |
| US11029606B2 | Optical element for the beam guidance of imaging light in projection lithography | Physics | 0 | Active |
| US8927090B2 | Method for bonding bodies and composite body | Emerging Cross-Sectional Technologies | 0 | Active |
| US9459538B2 | Lithography apparatus and method for producing a mirror arrangement | Physics | 0 | Active |
| US9996015B2 | Mirror module, in particular for a microlithographic projection exposure appararatus | Physics | 0 | Active |
| US10203607B2 | Optical element unit for exposure processes | Emerging Cross-Sectional Technologies | 0 | Active |
| US9869937B2 | Mirror arrangement for a lithography apparatus and method for producing the same | Emerging Cross-Sectional Technologies | 0 | Active |
| US10520838B2 | Mounting arrangement for an optical imaging arrangement | Physics | 0 | Active |
| US12393119B2 | Optical system and lithography apparatus | Physics | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.