Niobium-Nitride film forming compositions and vapor deposition of Niobium-Nitride films
US10023462B2 · kind B2 · utility
3Cited by
5References
16Claims
0Family size
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Key dates
| Filing date | Nov 30, 2015 |
| Grant date | Jul 17, 2018 |
| Priority date | — |
| Expiry date | Sep 12, 2036 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC23C16/45553
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
Disclosed are Niobium Nitride film forming compositions, methods of synthesizing the same, and methods of forming Niobium Nitride films on one or more substrates via vapor deposition processes using the Niobium Nitride film forming precursors.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.