Patent · US Active

Anti-transient showerhead

US10023959B2 · kind B2 · utility

18Cited by

184References

26Claims

0Family size

Assignee

Lam Research Corporation · US

Inventors

Edward Sung · Fremont, US
Colin F. Smith · Rue de l'Église, US
Shawn M. Hamilton · Ramona, US

Key dates

Filing date	May 24, 2016
Grant date	Jul 17, 2018
Priority date	—
Expiry date	Dec 17, 2036

Classification

Technology area (CPC C)Chemistry; Metallurgy
CPC primaryC23C16/45565
WIPO fieldSurface technology, coating
WIPO sectorChemistry

Abstract

Showerheads for semiconductor processing equipment are disclosed that include various features designed to minimize or eliminate non-uniform gas delivery across the surface of a wafer due to gas flow transients within the showerhead.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.