Patent assignee · US · COMPANY

Lam Research Corporation

3,863Patents
2,778Active
3,863Granted
62Portfolio score

Filing activity: Feb 13, 1981 → Mar 13, 2025 · 568 expiring within 5 years

Most-cited patents

PatentTitleAreaCited byStatus
US5356478A Plasma cleaning method for removing residues in a plasma treatment chamber Electricity 820 Expired
US6847014B1 Method and apparatus for controlling the spatial temperature distribution across the surface of a workpiece support Electricity 637 Expired
US4976996A Chemical vapor deposition reactor and method of use thereof Electricity 591 Expired
US8573152B2 Showerhead electrode Emerging Cross-Sectional Technologies 572 Active
US6106678A Method of high density plasma CVD gap-filling Electricity 565 Expired
US5294778A CVD platen heater system utilizing concentric electric heating elements Chemistry; Metallurgy 562 Expired
US5679215A Method of in situ cleaning a vacuum plasma processing chamber Emerging Cross-Sectional Technologies 560 Expired
US8617411B2 Methods and apparatus for atomic layer etching Electricity 551 Active
US5968275A Methods and apparatus for passivating a substrate in a plasma reactor Electricity 543 Expired
US7645341B2 Showerhead electrode assembly for plasma processing apparatuses Electricity 531 Expired
US8940646B1 Sequential precursor dosing in an ALD multi-station/batch reactor Electricity 519 Active
US8484846B2 Method of joining components for a composite showerhead electrode assembly for a plasma processing apparatus Emerging Cross-Sectional Technologies 507 Active
US7476291B2 High chamber temperature process and chamber design for photo-resist stripping and post-metal etch passivation Electricity 506 Active
US9257274B2 Gapfill of variable aspect ratio features with a composite PEALD and PECVD method Electricity 504 Active
US7998875B2 Vapor phase repair and pore sealing of low-K dielectric materials Electricity 501 Active
US4948458A Method and apparatus for producing magnetically-coupled planar plasma Electricity 499 Expired
US9214333B1 Methods and apparatuses for uniform reduction of the in-feature wet etch rate of a silicon nitride film formed by ALD Electricity 496 Active
US9685320B2 Methods for depositing silicon oxide Electricity 475 Active
US7651269B2 Temperature probes having a thermally isolated tip Physics 474 Active
US8282847B2 Photoresist double patterning Electricity 465 Active
US9875891B2 Selective inhibition in atomic layer deposition of silicon-containing films Electricity 458 Active
US8419959B2 Clamped monolithic showerhead electrode Electricity 457 Active
US7497614B2 Apparatus for determining a temperature of a substrate and methods therefor Physics 452 Active
US7376520B2 System and method for gas flow verification Physics 452 Expired
US9449793B2 Systems, methods and apparatus for choked flow element extraction Electricity 450 Active

Source: USPTO / EPO open patent data. Counts and citation impact are objective bibliographic measures.