Sulfonium compound, resist composition, and patterning process
US10025180B2 · kind B2 · utility
1Cited by
1References
19Claims
0Family size
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Key dates
| Filing date | Aug 30, 2017 |
| Grant date | Jul 17, 2018 |
| Priority date | — |
| Expiry date | Aug 30, 2037 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC07C2603/74
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A sulfonium salt containing an acid-eliminatable substituent group which is effective for improving contrast is highly soluble and uniformly dispersible. A resist composition comprising the sulfonium salt as photoacid generator forms a pattern with a high resolution, rectangularity, and reduced LWR.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.