Koji Hasegawa
259Patents
18h-index
135Co-inventors
89Inventor score
Filing activity: Feb 22, 1985 → Aug 4, 2022
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US7537880B2 | Polymer, resist composition, and patterning process | Emerging Cross-Sectional Technologies | 146 | Active |
| US6312867A | Ester compounds, polymers, resist compositions and patterning process | Emerging Cross-Sectional Technologies | 133 | Expired |
| US6280898A | Lactone-containing compounds, polymers, resist compositions, and patterning method | Physics | 117 | Expired |
| US6448420B1 | Acid-decomposable ester compound suitable for use in resist material | Physics | 109 | Expired |
| US6466163B2 | GPS receiver and portable communication apparatus | Electricity | 81 | Expired |
| US4757007A | Process for preparing hydrolyzed products of soy protein | Chemistry; Metallurgy | 77 | Expired |
| US7084303B2 | Tertiary amine compounds having an ester structure and processes for preparing same | Physics | 72 | Expired |
| US6147249A | Ester compounds, polymers, resist composition and patterning process | Emerging Cross-Sectional Technologies | 62 | Expired |
| US7670750B2 | Polymer, resist protective coating material, and patterning process | Physics | 46 | Active |
| US6480145B2 | GPS receiver and GPS position measurement method | Physics | 36 | Expired |
| US6284429A | Ester compounds, polymers, resist compositions and patterning process | Emerging Cross-Sectional Technologies | 33 | Expired |
| US7527912B2 | Photoacid generators, resist compositions, and patterning process | Emerging Cross-Sectional Technologies | 31 | Active |
| US7109828B2 | Surface acoustic wave device, and mobile communication device and sensor both using same | Electricity | 26 | Expired |
| US6746818B2 | (Meth)acrylates having lactone structure, polymers, photoresist compositions and patterning process | Emerging Cross-Sectional Technologies | 24 | Expired |
| US6492090B2 | Polymers, resist compositions and patterning process | Physics | 21 | Expired |
| US7622242B2 | Resist composition and patterning process | Emerging Cross-Sectional Technologies | 21 | Active |
| US7981589B2 | Fluorinated monomer, fluorinated polymer, resist composition and patterning process | Emerging Cross-Sectional Technologies | 19 | Active |
| US6138695A | Substrate processing apparatus | Emerging Cross-Sectional Technologies | 18 | Expired |
| US7642034B2 | Polymer, resist protective coating material, and patterning process | Physics | 15 | Active |
| US8114570B2 | Photoacid generator, resist composition, and patterning process | Emerging Cross-Sectional Technologies | 15 | Active |
| US6470726B1 | Method for manufacturing an extruded article changing in cross-section and an apparatus for extruding said extruded article | Performing Operations; Transporting | 14 | Expired |
| US6444396B1 | Ester compounds, polymers, resist composition and patterning process | Emerging Cross-Sectional Technologies | 14 | Expired |
| US8101335B2 | Resist composition and patterning process | Emerging Cross-Sectional Technologies | 13 | Active |
| US6399274B1 | Resist composition and patterning process | Physics | 13 | Expired |
| US8268528B2 | Resist composition and patterning process | Physics | 13 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.