Patent · US Active

Method of reducing residual contamination in singulated semiconductor die

US10026605B2 · kind B2 · utility

197Cited by
14References
23Claims
0Family size

Assignee

Inventors

Key dates

Filing dateSep 2, 2016
Grant dateJul 17, 2018
Priority date
Expiry dateOct 8, 2036

Classification

  • Technology area (CPC H)Electricity
  • CPC primaryH01L2924/0002
  • WIPO fieldSemiconductors
  • WIPO sectorElectrical engineering

Abstract

In one embodiment, semiconductor die are singulated from a semiconductor wafer by placing the semiconductor wafer onto a carrier tape, forming singulation lines through the semiconductor wafer, and reducing the presence of residual contaminates on the semiconductor wafer.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.