Patent · US Active

Illumination optical unit for a mask inspection system and mask inspection system with such an illumination optical unit

US10042248B2 · kind B2 · utility

1Cited by

2References

20Claims

0Family size

Assignee

Carl Zeiss SMT GmbH · DE

Inventors

Markus Degünther · Aalen, DE
Thomas Korb · Schwäbisch Gmünd, DE

Key dates

Filing date	Aug 14, 2015
Grant date	Aug 7, 2018
Priority date	—
Expiry date	Oct 22, 2035

Classification

Technology area (CPC G)Physics
CPC primaryG21K7/00
WIPO fieldEngines, pumps, turbines
WIPO sectorMechanical engineering

Abstract

An illumination optical unit for a mask inspection system is used with EUV illumination light. A hollow waveguide of the illumination optical unit serves for guiding the illumination light. The hollow waveguide has an entry opening for the illumination light and an exit opening for the illumination light. An imaging mirror optical unit, arranged downstream of the hollow waveguide serves to image the exit opening into an illumination field. This results in an illumination optical unit, the throughput of which is optimized for the EUV illumination light.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.