Mask inspection system for inspecting lithography masks

US10054426B2 · kind B2 · utility

Assignee

• Carl Zeiss SMT GmbH · DE

Inventors

• Jochen Hetzler · Aalen, DE
• Joachim Schroeder · Stuttgart, DE

Key dates

• Filing date: Oct 23, 2015
• Grant date: Aug 21, 2018
• Expiry date: Nov 9, 2036

Classification

• Technology area (CPC G): Physics
• CPC primary: G03F1/84
• WIPO field: Measurement
• WIPO sector: Instruments

Abstract

One aspect of the present invention relates to a mask inspection system for inspecting lithography masks, including a placement table for placing a lithography mask to be inspected, a first optical unit with a first beam path for examining structures of the lithography mask, and a second optical unit with a second beam path for establishing a position of at least one edge of the lithography mask. Here, the second beam path of the second optical unit passes at least once through a plane defined by the placement table.