Jochen Hetzler
27Patents
4h-index
28Co-inventors
59Inventor score
Filing activity: May 14, 2004 → Aug 10, 2022
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US7605926B1 | Optical system, method of manufacturing an optical system and method of manufacturing an optical element | Physics | 20 | Active |
| US7061626B1 | Method of manufacturing an optical element using a hologram | Physics | 13 | Expired |
| US7848031B2 | Hologram and method of manufacturing an optical element using a hologram | Physics | 9 | Active |
| US9046792B2 | Projection exposure tool for microlithography and method for microlithographic imaging | Physics | 5 | Active |
| US9442393B2 | Projection exposure tool for microlithography and method for microlithographic imaging | Physics | 4 | Active |
| US10502545B2 | Measuring method and measuring arrangement for an imaging optical system | Physics | 4 | Active |
| US8617774B2 | Method and calibration mask for calibrating a position measuring apparatus | Physics | 3 | Active |
| US10337850B2 | Interferometric measuring arrangement | Physics | 3 | Active |
| US11774237B2 | Method for calibrating a measuring apparatus | Physics | 2 | Active |
| US10527403B2 | Measuring device for interferometric determination of a shape of an optical surface | Physics | 1 | Active |
| US9606339B2 | Mirror of a projection exposure apparatus for microlithography with mirror surfaces on different mirror sides, and projection exposure apparatus | Physics | 1 | Active |
| US9709902B2 | Projection exposure tool for microlithography and method for microlithographic imaging | Physics | 1 | Active |
| US8089634B2 | Optical element and method of calibrating a measuring apparatus comprising a wave shaping structure | Emerging Cross-Sectional Technologies | 1 | Active |
| US10422718B2 | Test device and method for testing a mirror | Physics | 1 | Active |
| US8107054B2 | Microlithographic projection exposure apparatus | Physics | 0 | Active |
| US10054426B2 | Mask inspection system for inspecting lithography masks | Physics | 0 | Active |
| US10303068B2 | Projection exposure tool for microlithography and method for microlithographic imaging | Physics | 0 | Active |
| US11199396B2 | Compensation optical system for an interferometric measuring system | Physics | 0 | Active |
| US12235097B2 | Diffractive optical element for a test interferometer | Physics | 0 | Active |
| US8436982B2 | Projection objective for microlithography | Physics | 0 | Active |
| US12332043B2 | Measurement method for interferometrically determining a surface shape | Physics | 0 | Active |
| US10101667B2 | Method for aligning a mirror of a microlithographic projection exposure apparatus | Physics | 0 | Active |
| US9052606B2 | Microlithographic projection exposure apparatus | Physics | 0 | Active |
| US8982325B2 | Microlithographic projection exposure apparatus | Physics | 0 | Active |
| US11879720B2 | Device and method for characterizing the surface shape of a test object | Physics | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.