System and method for design based inspection
US10055534B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Mar 17, 2016 |
| Grant date | Aug 21, 2018 |
| Priority date | — |
| Expiry date | Jul 29, 2036 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F1/84
- WIPO fieldComputer technology
- WIPO sectorElectrical engineering
Abstract
A system for design based inspection of a lithographic mask of a first layer of an article, the system may include a decision module and a memory module; wherein the memory module is configured to store (a) first layer information about an outcome of an illumination of the lithographic mask during a lithographic process, (b) design information related to an irrelevant area to be removed from the first layer of the article after a manufacturing of the first layer of the article; and wherein the decision module is configured to process the first layer information to detect lithographic mask defects and to reduce a significance of a lithographic mask defect that is positioned within the irrelevant area.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.