Patent · US Active

Backing plate for a sputter target, sputter target, and sputter device

US10060023B2 · kind B2 · utility

0Cited by

4References

21Claims

0Family size

Assignee

Infineon Technologies AG · DE

Inventors

Markus Fischer · Offenburg, DE
Wolfram Karcher · Osterburken, DE
Barbara Jeansannetas

Key dates

Filing date	Oct 19, 2012
Grant date	Aug 28, 2018
Priority date	—
Expiry date	Jan 8, 2034

Classification

Technology area (CPC H)Electricity
CPC primaryH01J37/3482
WIPO fieldElectrical machinery, apparatus, energy
WIPO sectorElectrical engineering

Abstract

A backing plate for a sputter target includes a target receiving part for receiving a target to be sputtered, and a structure for exposing the target receiving part through the backing plate.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.