Method for verifying a pattern of features printed by a lithography process
US10061209B2 · kind B2 · utility
Assignees
Inventors
Key dates
| Filing date | May 9, 2016 |
| Grant date | Aug 28, 2018 |
| Priority date | — |
| Expiry date | Jul 28, 2036 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG06T2207/30148
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
The disclosure relates to a method for verifying a printed pattern. In an example embodiment, the method includes defining sectors of at least a portion of the features in the reference pattern, determining a contour of the printed pattern, and superimposing the contour of the printed pattern on the reference pattern. The method also includes determining surface areas of sectors of the printed pattern that correspond to the sectors of the reference pattern and calculating one or more parameters as a function of at least one of the surface areas, the parameters being related to a single sector or to multiple sectors. The method additionally includes evaluating the parameters with respect to a reference value.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.