Extreme ultraviolet light source

US10064261B2 · kind B2 · utility

Assignee

• ASML NETHERLANDS B.V. · NL

Inventors

• Yezheng Tao · San Diego, US
• John Tom Stewart, IV · Escondido, US
• Jordan Jur · Timnath, US
• Daniel J. W. Brown · San Diego, US
• Alexander Anthony Schafgans · San Diego, US
• Jason Michael Arcand · Escondido, US
• Andrew David LaForge · Poway, US

Key dates

• Filing date: Oct 23, 2017
• Grant date: Aug 28, 2018
• Expiry date: Oct 23, 2037

Classification

• Technology area (CPC Y): Emerging Cross-Sectional Technologies
• CPC primary: Y02E30/10
• WIPO field: Medical technology
• WIPO sector: Instruments

Abstract

An initial pulse of radiation is generated; a section of the initial pulse of radiation is extracted to form a modified pulse of radiation, the modified pulse of radiation including a first portion and a second portion, the first portion being temporally connected to the second portion, and the first portion having a maximum energy that is less than a maximum energy of the second portion; the first portion of the modified pulse of radiation is interacted with a target material to form a modified target; and the second portion of the modified pulse of radiation is interacted with the modified target to generate plasma that emits extreme ultraviolet (EUV) light.