ASML NETHERLANDS B.V.
4,858Patents
3,962Active
4,858Granted
63Portfolio score
Filing activity: Feb 27, 1998 → Apr 30, 2024 · 1,020 expiring within 5 years
Most-cited patents
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US6952253B2 | Lithographic apparatus and device manufacturing method | Physics | 706 | Expired |
| US6603130B1 | Gas bearings for use with vacuum chambers and their application in lithographic projection apparatuses | Mechanical Engineering; Lighting; Heating | 483 | Expired |
| US6778257B2 | Imaging apparatus | Physics | 479 | Expired |
| US7199858B2 | Lithographic apparatus and device manufacturing method | Physics | 298 | Expired |
| US7075616B2 | Lithographic apparatus and device manufacturing method | Physics | 283 | Expired |
| US6954256B2 | Gradient immersion lithography | Emerging Cross-Sectional Technologies | 220 | Expired |
| US6961116B2 | Lithographic apparatus, device manufacturing method, and device manufactured thereby | Emerging Cross-Sectional Technologies | 207 | Expired |
| US7161659B2 | Dual stage lithographic apparatus and device manufacturing method | Physics | 196 | Expired |
| US7081943B2 | Lithographic apparatus and device manufacturing method | Physics | 171 | Expired |
| US7193232B2 | Lithographic apparatus and device manufacturing method with substrate measurement not through liquid | Physics | 168 | Expired |
| US7213963B2 | Lithographic apparatus and device manufacturing method | Physics | 160 | Expired |
| US7009682B2 | Lithographic apparatus and device manufacturing method | Physics | 156 | Expired |
| US7352434B2 | Lithographic apparatus and device manufacturing method | Physics | 134 | Expired |
| US7394521B2 | Lithographic apparatus and device manufacturing method | Physics | 131 | Expired |
| US6819425B2 | Lithographic apparatus, device manufacturing method, and device manufactured thereby | Physics | 129 | Expired |
| US7362446B2 | Position measurement unit, measurement system and lithographic apparatus comprising such position measurement unit | Physics | 123 | Expired |
| US7253875B1 | Lithographic apparatus and device manufacturing method | Physics | 121 | Expired |
| US7119874B2 | Lithographic apparatus and device manufacturing method | Physics | 118 | Expired |
| US7388648B2 | Lithographic projection apparatus | Physics | 115 | Expired |
| US7102729B2 | Lithographic apparatus, measurement system, and device manufacturing method | Physics | 114 | Expired |
| US6452662B2 | Lithography apparatus | Physics | 114 | Expired |
| US7256871B2 | Lithographic apparatus and method for calibrating the same | Physics | 113 | Expired |
| US7050146B2 | Lithographic apparatus and device manufacturing method | Physics | 113 | Expired |
| US7349069B2 | Lithographic apparatus and positioning apparatus | Physics | 113 | Expired |
| US7289212B2 | Lithographic apparatus, device manufacturing method and device manufacturing thereby | Physics | 113 | Expired |
Source: USPTO / EPO open patent data. Counts and citation impact are objective bibliographic measures.