Method of manufacturing pellicle assembly and method of photomask assembly including the same
US10065402B2 · kind B2 · utility
2Cited by
2References
19Claims
0Family size
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Key dates
| Filing date | Feb 3, 2016 |
| Grant date | Sep 4, 2018 |
| Priority date | — |
| Expiry date | May 15, 2036 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/00
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A method of manufacturing a pellicle assembly, the method including attaching a carbon-containing thin film onto a transfer membrane in a wet atmosphere; attaching the carbon-containing thin film to a pellicle frame in a dry atmosphere while the carbon-containing thin film is attached onto the transfer membrane; and separating the transfer membrane from the carbon-containing thin film while the carbon-containing thin film is attached to the pellicle frame.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.