Inventor · Mado-myeon, KR

Mun Ja Kim

23Patents
2h-index
47Co-inventors
53Inventor score

Filing activity: Nov 3, 2009 → Jan 4, 2024

Most-cited inventions

PatentTitleAreaCited byStatus
US9703186B2 Mask including pellicle, pellicle repairing apparatus, and substrate manufacturing equipment Physics 6 Active
US10437143B2 Pellicle for exposure to extreme ultraviolet light, photomask assembly, and method of manufacturing the pellicle Physics 2 Active
US9690190B2 Pellicles and methods of manufacturing the same Chemistry; Metallurgy 2 Active
US10065402B2 Method of manufacturing pellicle assembly and method of photomask assembly including the same Electricity 2 Active
US10001700B2 Pellicle film including graphite-containing thin film for extreme ultraviolet lithography Physics 1 Active
US8110979B2 Inorganic electroluminescence device, display apparatus having the same and method thereof Electricity 1 Active
US11262648B2 Pellicle for photomask and method of fabricating the same Physics 0 Active
US10747104B2 Method of manufacturing pellicle and apparatus for assembling pellicle Physics 0 Active
US12346022B2 Method of fabricating pellicle structure Physics 0 Active
US10809614B2 Pellicle for photomask and method of fabricating the same Physics 0 Active
US11067887B2 Apparatus for manufacturing pellicle Physics 0 Active
US12258494B2 Adhesive for pellicle, pellicle for photo mask and method for manufacturing the same Chemistry; Metallurgy 0 Active
US11448957B2 Pellicle transfer apparatus and method Physics 0 Active
US12018183B2 Adhesive composition, method for preparing the same, reticle assembly including the same, and method for fabricating reticle assembly including the same Chemistry; Metallurgy 0 Active
US9176375B2 Methods of reducing a registration error of a photomask, and related photomasks and methods of manufacturing an integrated circuit Physics 0 Active
US11892767B2 Stud attachment device and stud attachment method with independent temperature/pressure control Physics 0 Active
US11073757B2 Methods of manufacturing pellicle assembly and photomask assembly Physics 0 Active
US10345698B2 Method for fabricating semiconductor device Electricity 0 Active
US10969702B2 Extreme ultraviolet lithography apparatus Physics 0 Active
US10103071B2 Pattern inspection methods and methods of fabricating reticles using the same via directing charged particle beams through discharge layers Electricity 0 Active
US12297379B2 Adhesive composition, method for preparing the same, reticle assembly including the same, and method for fabricating reticle assembly including the same Chemistry; Metallurgy 0 Active
US11729896B2 Apparatus for generating extreme ultraviolet (EUV), method of manufacturing the same, and EUV system Physics 0 Active
US10394117B2 Pellicle film including graphite-containing thin film for extreme ultraviolet lithography Physics 0 Active

Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.