Patent · US Active

Direct liquid deposition

US10066287B2 · kind B2 · utility

0Cited by

7References

26Claims

0Family size

Assignee

EVATEC AG · CH

Inventors

Stephan Voser · Buchs, CH
Fabio Antonio Ravelli · Buchs, CH
Bruno Gaechter · Altdorf, CH

Key dates

Filing date	Sep 10, 2015
Grant date	Sep 4, 2018
Priority date	—
Expiry date	Aug 30, 2036

Classification

Technology area (CPC C)Chemistry; Metallurgy
CPC primaryC23C14/50
WIPO fieldSurface technology, coating
WIPO sectorChemistry

Abstract

Liquid precursor material of a coating substance and a solvent is provided in a reservoir (STEP1, STEP1′). In one variant the liquid precursor material is distilled (STEP2), the resultant liquid coating substance is vaporized (STEP3) and ejected through a vapor distribution nozzle arrangement (7) into a vacuum recipient (3) and onto substrate 5 to be coated. Alternatively, the liquid precursor material is directly vaporized (STEP3′). From the two-component vapor coating substance vapor is applied to substrate 5′ to be coated. In this variant separation of solvent vapor and coating substance vapor is performed especially downstream vaporizing (STEP2′).

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.