Target, method for producing the same, memory, and method for producing the same
US10069066B2 · kind B2 · utility
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Key dates
| Filing date | Jun 27, 2016 |
| Grant date | Sep 4, 2018 |
| Priority date | — |
| Expiry date | Aug 14, 2036 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T428/31678
- WIPO fieldMaterials, metallurgy
- WIPO sectorChemistry
Abstract
A target including: at least one refractory metal element selected from the group consisting of Ti, Zr, Hf, V, Nb, Ta, and lanthanoids; at least one element selected from the group consisting of Al, Ge, Zn, Co, Cu, Ni, Fe, Si, Mg, and Ga; and at least one chalcogen element selected from the group consisting of S, Se, and Te. And a method for producing the target.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.