Apparatus and method for plasma ignition with a self-resonating device
US10076020B2 · kind B2 · utility
1Cited by
13References
29Claims
0Family size
Assignee
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Key dates
| Filing date | Jul 6, 2017 |
| Grant date | Sep 11, 2018 |
| Priority date | — |
| Expiry date | Jul 6, 2037 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH05H1/4652
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
Methods and apparatus for igniting a process plasma within a plasma chamber are provided. One or more self-resonating devices are positioned within a plasma chamber relative to a plasma generation volume within the plasma chamber. The plasma generation volume is defined by the plasma chamber. Each of the self-resonating devices generates an ignition plasma. The ignition plasmas cause a partial ionization of an ignition gas. The partially ionized ignition gas allows for ignition of a process plasma by applying an electric field to the plasma generation volume.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.