Patent · US Active

Evaporation apparatus with gas supply

US10081866B2 · kind B2 · utility

0Cited by

1References

14Claims

0Family size

Assignee

Applied Materials, Inc. · US

Inventors

Gerd Hoffmann · Bruchköbel, DE
Sven Schramm · Coburg, DE
Roland TRASSL · Gießen, DE

Key dates

Filing date	Jul 12, 2013
Grant date	Sep 25, 2018
Priority date	—
Expiry date	Nov 23, 2036

Classification

Technology area (CPC C)Chemistry; Metallurgy
CPC primaryC23C14/562
WIPO fieldSurface technology, coating
WIPO sectorChemistry

Abstract

An evaporation apparatus for depositing material on a substrate by a drum is described. The evaporation apparatus includes a first set of evaporation crucibles aligned in a first line a first direction for depositing evaporated material on the substrate; a first gas supply pipe extending in the first direction being arranged between at least one of the evaporation crucibles of the first set of evaporation crucibles and the drum; and a second gas supply pipe extending in the first direction for providing a gas between the first set of evaporation crucibles and the drum with openings shaped and positioned to improve the uniformity of the deposition of the material.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.