Method for determining a position of a structure element on a mask and microscope for carrying out the method
US10089733B2 · kind B2 · utility
2Cited by
12References
27Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Sep 30, 2016 |
| Grant date | Oct 2, 2018 |
| Priority date | — |
| Expiry date | Nov 20, 2036 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG06T2207/30148
- WIPO fieldComputer technology
- WIPO sectorElectrical engineering
Abstract
A method and a microscope for determining a position of a structure element on a mask are provide. The method comprises predefining a region on the mask which comprises at least the structure element; determining a phase image of the region, wherein the phase image comprises in a spatially resolved manner the phase of the imaging of the mask by the illumination radiation; and determining the position of the structure element within the phase image.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.