Dirk Seidel
21Patents
2h-index
22Co-inventors
53Inventor score
Filing activity: Jul 23, 2010 → Sep 1, 2023
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US10108085B2 | Method for localizing defects on substrates | Physics | 11 | Active |
| US8694929B2 | Method and apparatus for the position determination of structures on a mask for microlithography | Physics | 3 | Active |
| US10089733B2 | Method for determining a position of a structure element on a mask and microscope for carrying out the method | Physics | 2 | Active |
| US9297994B2 | Grating-assisted autofocus device and autofocusing method for an imaging device | Physics | 2 | Active |
| US11774859B2 | Method and apparatus for evaluating an unknown effect of defects of an element of a photolithography process | Physics | 1 | Active |
| US10585274B2 | Method for capturing and compensating ambient effects in a measuring microscope | Physics | 1 | Active |
| US9786046B2 | Method and device for determining a lateral offset of a pattern on a substrate relative to a desired position | Physics | 1 | Active |
| US11892769B2 | Method for detecting an object structure and apparatus for carrying out the method | Physics | 1 | Active |
| US12111579B2 | Method and apparatus for evaluating an unknown effect of defects of an element of a photolithography process | Physics | 0 | Active |
| US8693805B2 | Determination of the relative position of two structures | Physics | 0 | Active |
| US10599936B2 | Method for correcting the distortion of a first imaging optical unit of a first measurement system | Physics | 0 | Active |
| US12307334B2 | Method and device for evaluating a statistically distributed measured value in the examination of an element of a photolithography process | Physics | 0 | Active |
| US10113864B2 | Method for determining the registration of a structure on a photomask and apparatus to perform the method | Physics | 0 | Active |
| US12001145B2 | Apparatus and method for analyzing an element of a photolithography process with the aid of a transformation model | Physics | 0 | Active |
| US11631168B2 | Method, computer program and apparatus for determining a quality of a mask of a photolithography apparatus | Physics | 0 | Active |
| US9303975B2 | Method for determining the registration of a structure on a photomask and apparatus to perform the method | Physics | 0 | Active |
| US11947185B2 | Autofocusing method for an imaging device | Electricity | 0 | Active |
| US11079586B2 | Measuring microscope for measuring masks for lithographic methods and measuring method and calibration method therefor | Physics | 0 | Active |
| US10380733B2 | Method and apparatus for determining the position of structure elements of a photolithographic mask | Physics | 0 | Active |
| US9785058B2 | Method for ascertaining distortion properties of an optical system in a measurement system for microlithography | Physics | 0 | Active |
| US11243392B2 | Method for determining an imaging function of a mask inspection microscope, and mask inspection microscope | Physics | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.