Patent · US Active

Water-repellent protective film, and chemical solution for forming protective film

US10090148B2 · kind B2 · utility

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6References
2Claims
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Key dates

Filing dateJul 4, 2013
Grant dateOct 2, 2018
Priority date
Expiry dateJan 7, 2035

Classification

  • Technology area (CPC C)Chemistry; Metallurgy
  • CPC primaryC11D2111/22
  • WIPO fieldBasic materials chemistry
  • WIPO sectorChemistry

Abstract

A surface treatment was conducted by using a liquid chemical containing a water-repellent protective film forming agent represented by the following general formula [1], subsequent to a step of cleaning a metal-based wafer and prior to a step of drying the wafer.(R1 represents a C1-C18 monovalent hydrocarbon group the hydrogen elements of which may partially or entirely be replaced with a fluorine element(s). R2 mutually independently represents a monovalent organic group having a C1-C18 hydrocarbon group the hydrogen elements of which may partially or entirely be replaced with a fluorine element(s). “a” is an integer of from 0 to 2.)

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.