Patent · US Active

Photomask having a plurality of shielding layers

US10095102B2 · kind B2 · utility

2Cited by
0References
20Claims
0Family size

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Inventors

Key dates

Filing dateNov 28, 2016
Grant dateOct 9, 2018
Priority date—
Expiry dateNov 28, 2036

Classification

  • Technology area (CPC G)Physics
  • CPC primaryG03F1/54
  • WIPO fieldOptics
  • WIPO sectorInstruments

Abstract

In some embodiments, a patterned photomask has a plurality of shielding layers. In some embodiments, a photomask for mask patterning is described. The photomask includes a phase shift layer overlying a transparent layer. The photomask also includes a first shielding layer overlying the phase shift layer. The first shielding layer has a first thickness and a first optical density. The photomask further includes a second shielding layer overlying the first shielding layer. The second shielding layer has a second thickness and a second optical density. The second thickness is less that than the first thickness and the second optical density is less than the first optical density.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.