Systems and methods for fabricating metrology targets with sub-resolution features
US10095122B1 · kind B1 · utility
Assignee
Inventors
Key dates
| Filing date | Oct 10, 2016 |
| Grant date | Oct 9, 2018 |
| Priority date | — |
| Expiry date | Oct 10, 2036 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F1/84
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A lithography system includes an illumination source, a pattern mask, and an optical element configured to expose a sample with an image of the pattern mask for the fabrication of one or more printed device structures and one or more metrology target structures. The pattern mask includes a device pattern mask area and a metrology target pattern mask area. The device pattern mask area includes a set of device pattern elements distributed with a device pitch. The metrology target pattern mask area includes a set of metrology target pattern elements. The one or more printed metrology target structures include a set of metrology target elements distributed with a metrology target pitch. Regions of the metrology target pattern mask area include sub-resolution features having widths smaller than the resolution of the optical element such that the sub-resolution pattern elements are not included on the one or more printed metrology target structures.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.